What are the advantages and limitations implantation of ion implantation?

What are the advantages and limitations implantation of ion implantation?
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1 Answer

Answer :

Advantages:

• Accurate control over doping

• Very good reproducibility

• Precise resistance value

• A room temperature process

Limitations:

• Annealing at higher temperature is required for avoiding the crystal damage

• The possibility of dopant implanting through various layers of wafer.
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